CLEANING SOLUTIONS • Chromium Etchants • Cleaning Solutions • E-Beam Process Chemistries • Photoresist Strippers • Positive Photoresist Developers • Pre-Mixed Metal Etchants Cyantek offers cleaning solutions for mask, flat panel display and wafer applications. These products are formulated to clean emulsion, chrome and iron oxide masks (glass and quartz substrates) as well as silicon, GaAs and copper metallization. The solutions are pre-mixed and ready to be used from the bottle. A brief synopsis of these products is displayed in the following table: Product Mixture Description Nano-Strip Aqueous • An acidic (pH < 1) and oxidizing cleaner • A stable pre-mixed solution of sulfuric and peroxide • Cleans glass, quartz and other substrates • Removes both organic and inorganic residues • Room temp. to 60?C operation RA-2 Semi-aqueous • An aqueous alkaline (pH = 11) cleaner • Cleans glass, silicon, SS, porcelain, ceramic and plastic • Removes oils, particulates and solvent residues • Room temp. to 50?C process SSC-1 Semi-aqueous • An aqueous acidic (pH = 2.0-3.0) cleaner • Citric acid based • Cleans GaAs, Cu, glass, SS, ceramic and plastic • Removes trace metals, particulates, oils and solvents • Room temp. process MC-100 Semi-aqueous • A concentrated aqueous alkaline (pH = 9.5) cleaner • 1:100 typical dilution, or modified as needed • Cleans glass, metals , ceramic and other substrates • Removes particles, oils and other residues • Room temp. operation MC-171C Semi-aqueous • A concentrated aqueous alkaline (pH = 12) cleaner • 1:17 typical dilution, or modified as needed • Ammonium hydroxide based with added surfactant • Cleans glass and quartz substrates • A common cleaner in the photomask industry • Room temp. operation CA-31 Semi-aqueous • An aqueous alkaline (pH = 12) cleaner • Ammonium hydroxide with non-PFOS surfactant • Cleans glass, quartz and other substrates • Room temp. operation CA-40 Aqueous • An aqueous caustic (pH~12.5) cleaner • Cleans emulsion, chrome and iron oxide photomasks • Removes organic residues and particles • Room temp. operation

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